Summary Vaisala's inline process refractometers are uniquely suited to CMP slurry management by controlling batch-to-batch variation and dilution of the slurry as well as blending of the oxidizing agent such as H2O2. This level of control is accomplished by using refractive index to continuously monitor liquid concentration, without being impeded by bubbles, ensuring a repeatable CMP process. By verifying that slurries consistently meet requirements, these instruments allow manufacturers to extend equipment uptime, maximize raw material usage, and reduce maintenance costs. Register for this webinar to learn why Vaisala process refractometers have been installed by hundreds of semiconductor manufacturers worldwide. We’ll review the technology behind our measurement solutions and share common applications before sharing sample use cases from fabricators. If you have already attended or registered for this webinar, please click here. Otherwise, please watch the recorded webinar by filling the form. Email Address*First Name*Last Name*Company*Country*--Please Select--United StatesUnited KingdomCanadaChinaIndiaJapanAustraliaBrazilFranceGermanyFinland--------------AfghanistanÅland IslandsAlbaniaAlgeriaAmerican SamoaAndorraAngolaAnguillaAntarcticaAntigua and BarbudaArgentinaArmeniaArubaAustraliaAustriaAzerbaijanBahamasBahrainBangladeshBarbadosBelarusBelgiumBelizeBeninBermudaBhutanBoliviaBosnia and HerzegovinaBotswanaBouvet IslandBrazilBrit/Indian Ocean Terr.Brunei DarussalamBulgariaBurkina FasoBurundiCambodiaCameroonCanadaCape VerdeCayman IslandsCentral African RepublicChadChileChinaChristmas IslandCocos (Keeling) IslandsColombiaComorosCongoCongo, The Dem. Republic OfCook IslandsCosta RicaCôte D'IvoireCroatiaCubaCyprusCzech RepublicDenmarkDjiboutiDominicaDominican RepublicEcuadorEgyptEl SalvadorEquatorial GuineaEritreaEstoniaEthiopiaFalkland IslandsFaroe IslandsFijiFinlandFranceFrench GuianaFrench PolynesiaFrench Southern Terr.GabonGambiaGeorgiaGermanyGhanaGibraltarGreeceGreenlandGrenadaGuadeloupeGuamGuatemalaGuineaGuinea-BissauGuyanaHaitiHeard/McDonald Isls.HondurasHong KongHungaryIcelandIndiaIndonesiaIranIraqIrelandIsraelItalyJamaicaJapanJordanKazakhstanKenyaKiribatiKorea (North)Korea (South)KuwaitKyrgyzstanLaosLatviaLebanonLesothoLiberiaLibyaLiechtensteinLithuaniaLuxembourgMacauMacedoniaMadagascarMalawiMalaysiaMaldivesMaliMaltaMarshall IslandsMartiniqueMauritaniaMauritiusMayotteMexicoMicronesiaMoldovaMonacoMongoliaMontenegroMontserratMoroccoMozambiqueMyanmarN. Mariana Isls.NamibiaNauruNepalNetherlandsNetherlands AntillesNew CaledoniaNew ZealandNicaraguaNigerNigeriaNiueNorfolk IslandNorthern IrelandNorwayOmanPakistanPalauPalestinian Territory, OccupiedPanamaPapua New GuineaParaguayPeruPhilippinesPitcairnPolandPortugalPuerto RicoQatarReunionRomaniaRussian FederationRwandaSaint Kitts and NevisSaint LuciaSamoaSan MarinoSao Tome/PrincipeSaudi ArabiaSenegalSerbiaSeychellesSierra LeoneSingaporeSlovak RepublicSloveniaSolomon IslandsSomaliaSouth AfricaSpainSri LankaSt. HelenaSt. Pierre and MiquelonSt. Vincent and GrenadinesSudanSurinameSvalbard/Jan Mayen Isls.SwazilandSwedenSwitzerlandSyriaTaiwanTajikistanTanzaniaThailandTimor-LesteTogoTokelauTongaTrinidad and TobagoTunisiaTurkeyTurkmenistanTurks/Caicos Isls.TuvaluUgandaUkraineUnited Arab EmiratesUnited KingdomUnited StatesUS Minor Outlying Is.UruguayUzbekistanVanuatuVatican CityVenezuelaViet NamVirgin Islands (British)Virgin Islands (U.S.)Wallis/Futuna Isls.Western SaharaYemenZambiaZimbabweState or Province*--Please Select--Other - not US or CAAlaskaAlabamaArkansasArizonaCaliforniaColoradoConnecticutD.C.DelawareFloridaMicronesiaGeorgiaHawaiiIowaIdahoIllinoisIndianaKansasKentuckyLouisianaMassachusettsMarylandMaineMichiganMinnesotaMissouriMarianasMississippiMontanaNorth CarolinaNorth DakotaNebraskaNew HampshireNew JerseyNew MexicoNevadaNew YorkOhioOklahomaOregonPennsylvaniaRhode IslandSouth CarolinaSouth DakotaTennesseeTexasUtahVirginiaVermontWashingtonWisconsinWest VirginiaWyomingAlbertaManitobaBritish ColumbiaNew BrunswickNewfoundland and LabradorNova ScotiaNorthwest TerritoriesNunavutOntarioPrince Edward IslandQuebecSaskatchewanYukon TerritoryBusiness Phone*I authorize Vaisala to send me information about relevant products and services. See our Privacy Policy for more details. You can modify your preference settings or unsubscribe at any time here
Learn More About the CMP Process By accurately controlling and reducing wafer cleaning chemical consumption, manufacturers can maximize semiconductor throughput. Measuring CMP slurry concentration with Vaisala Process Refractometers also prevents defective chemicals from entering the process, protecting valuable fabrication equipment. Download the Application Note
Improve Wafer Production Quality The CMP process relies heavily on a precise slurry mixture, and directly impacts semiconductor manufacturability. Vaisala in-line process refractometers can not only control this early phase of production, but also increase equipment uptime and chemical shelf-life. Read the Case Study
Speaker Kimmo Koivula Sales Manager Kimmo Koivula holds a Master's degree from the Helsinki University of Technology and has more than 10 years of experience in automation and optimization of industrial processes. The last 6 years, Kimmo developed his skills as a consultant in Europe and America, supporting industrial plants through cutting-edge technology.
